Click image to view full sizeItem-Name:
CVD Graphene
CVD Graphene
More-Details:
電漿反應系統
Femto Science
CVD Graphene
腔體尺寸: 55 Dia. × 1300 L, mm
腔體溫度: 最高1200˚ C
功率: 300W, 20 – 100 KHz
控制器: 7吋觸控面板，自動/手動控制
設備尺寸: 1750 × 700 × 1200 (W × D × H, mm)
選配套件: 300W RF產生器
More Products
Surface Treatment
Plasma reaction system Femto Science Surface Treatment Equipment Exquisite design, a variety of cavity sizes and power to choose from, can be equipped with a quartz reaction tube, supports up to 6 groups of gas pipelines. Fully equipped with 7-inch touch panel, fully automatic system control Cavity size: 140 × 200 × 110 (W × D × H, mm) power: 100W, 20 – 100 KHz Controller: 7-inch touch panel, automatic / manual control Equipment size: 580 × 580 × 340 (W × D × H, mm) Cavity size: 200 × 220 × 160 (W × D × H, mm) power: 200W, 20 – 100 KHz Controller: 7-inch touch panel, automatic / manual control Equipment size: 618 × 630 × 460 (W × D × H, mm) Cavity size: 330 × 350 × 250 (W × D × H, mm) power: 300W, 20 – 100 KHz Controller: 7-inch touch panel, automatic / manual control Equipment size: 780 × 760 × 800 (W × D × H, mm) Optional kit: Quartz tube (200 Dia. × 300 L, mm), RF generator (300W) Cavity size: customized power: highest 2000W, 20 – 100 KHz Controller: 7-inch touch panel, automatic / manual control Gas line: 最多6組 Optional kit: Quartz tube, RF generator
Etching System
電漿反應系統 Femto Science Etching System 電漿蝕刻系統 腔體尺寸: 9.2英吋 功率: 300W, 13.56 MHz 氣體管路: 最多6組 控制器: 7吋觸控面板，自動/手動控制 設備尺寸: 680 × 1100 × 1300 (W × D × H, mm)
Coating System
電漿反應系統 Femto Science Coating System 水平式腔體: 203 Dia. × 440 L, mm 垂直式腔體: 300 Dia. × 400 L, mm 蒸發器溫度: 最高200˚ C 腔體溫度: 最高1000˚ C 控制器: 7吋觸控面板，自動/手動控制 設備尺寸: 1500 × 800 × 1180 (W × D × H, mm)
